Dr. Akira Jinguji Profile

Dr. Akira Jinguji

at Institute of Science Tokyo

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Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

Pre-training CNN for fast EUV lithography simulation including M3D effects

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12954, 129540I (2024) https://doi.org/10.1117/12.3009880

KEYWORDS: Education and training, Fourier transforms, 3D mask effects, Diffraction, Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Far field diffraction

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SPIE Journal Paper | 2 January 2024 Open Access

Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 23, Issue 01, 014201, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014201

KEYWORDS: 3D modeling, 3D mask effects, Diffraction, Extreme ultraviolet lithography, Light sources and illumination, Waveguides, Waveguide modes, Wave equations, Extreme ultraviolet, Fourier transforms

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Proceedings Article | 21 November 2023 Presentation + Paper

Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12750, 127500D (2023) https://doi.org/10.1117/12.2688029

KEYWORDS: Photomasks, 3D modeling, Diffraction, Extreme ultraviolet lithography, Waveguides, Waveguide modes, Light sources and illumination, Extreme ultraviolet, Wave equations, Dielectric polarization

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SPIE Journal Paper | 15 June 2023 Open Access

Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 22, Issue 02, 024201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024201

KEYWORDS: Education and training, Metals, Diffraction, 3D mask effects, Optical proximity correction, Fourier transforms, Convolutional neural networks, Extreme ultraviolet, Cadmium, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12495, 124951J (2023) https://doi.org/10.1117/12.2659063

KEYWORDS: 3D mask effects, Optical proximity correction, 3D modeling, Diffraction, Extreme ultraviolet lithography, Convolutional neural networks

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