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Akinori Shibuya
at FUJIFILM Corp
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Publications (1)
Proceedings Article | 1 April 2009 Paper
Properties of the novel deprotecting unit for next-generation ArF resist polymer
Akinori Shibuya, Shuhei Yamaguchi, Yuko Yoshida, Michihiro Shirakawa
Proceedings Volume 7273, 72730H (2009) https://doi.org/10.1117/12.814096
KEYWORDS: Polymers, Electroluminescence, Diffusion, Lithography, Chemically amplified resists, Line width roughness, Optical lithography, Control systems, Photoresist processing, Rutherfordium
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