Subwavelength metamaterials allow to synthesize tailored optical properties which enabled the demonstration of photonic devices with unprecedented performance and scale of integration. Yet, the development of metamaterial-based devices often involves a large number of interrelated parameters and figures of merit whose manual design can be impractical or lead to suboptimal solutions. In this invited talk, we will discuss the potentiality offered by multi-objective optimization and machine learning for the design of high-performance photonic devices based on metamaterials. We will present both integrated devices for on-chip photonic systems as well as recent advances in the development of devices for free-space applications and optical beam control.
The widespread use of metamaterials and non-trivial geometries has radically changed the way photonic integrated devices are developed, opening new design possibility and allowing for unprecedented performance. Yet, these devices are often described by a large number of interrelated parameters which cannot be handled manually, requiring innovative design approaches for their effective optimization. In this invited talk, we will discuss the potentiality offered by the combination of machine learning dimensionality reduction and multi-objective optimization for the design of high performance photonic integrated devices.
Machine-assisted design of integrated photonic devices (e.g. through optimization and inverse design methods) is opening the possibility of exploring very large design spaces, novel functionalities and non-intuitive geometries. These methods are generally used to optimize performance figures-of-merit. On the other hand, the effect of manufacturing variability remains a fundamental challenge since small fabrication errors can have a significant impact on light propagation, especially in high-index-contrast platforms. Brute-force analysis of these variabilities during the main optimization process can become prohibitive, since a large number of simulations would be required. To this purpose, efficient stochastic techniques integrated in the design cycle allow to quickly assess the performance robustness and the expected fabrication yield of each tentative device generated by the optimization. In this invited talk we present an overview of the recent advances in the implementation of stochastic techniques in photonics, focusing in particular on stochastic spectral methods that have been regarded as a promising alternative to the classical Monte Carlo method. Polynomial chaos expansion techniques generate so called surrogate models by means of an orthogonal set of polynomials to efficiently represent the dependence of a function to statistical variabilities. They achieve a considerable reduction of the simulation time compared to Monte Carlo, at least for mid-scale problems, making feasible the incorporation of tolerance analysis and yield optimization within the photonic design flow.
Unavoidable statistical variations in fabrication processes have a strong effect on the functionality of fabricated photonic circuits and on fabrication yield. It is hence essential to measure and consider these uncertainties during the design in order to predict the statistical behavior of the realized circuits. Also, during the mass production of photonic integrated circuits, the experimental evaluation of circuits’ desired quantity of interest in the presence of fabrication error can be crucial. In this paper we proposed the use of generalized polynomial chaos method to estimate the statistical properties of a circuit from a reduced number of experimental data whilst achieving good accuracy comparable to those obtained by Monte Carlo.
The Building Block (BB) approach has recently emerged in photonic as a suitable strategy for the analysis and design of complex circuits. Each BB can be foundry related and contains a mathematical macro-model of its functionality. As well known, statistical variations in fabrication processes can have a strong effect on their functionality and ultimately affect the yield. In order to predict the statistical behavior of the circuit, proper analysis of the uncertainties effects is crucial. This paper presents a method to build a novel class of Stochastic Process Design Kits for the analysis of photonic circuits. The proposed design kits directly store the information on the stochastic behavior of each building block in the form of a generalized-polynomial-chaos-based augmented macro-model obtained by properly exploiting stochastic collocation and Galerkin methods. Using this approach, we demonstrate that the augmented macro-models of the BBs can be calculated once and stored in a BB (foundry dependent) library and then used for the analysis of any desired circuit. The main advantage of this approach, shown here for the first time in photonics, is that the stochastic moments of an arbitrary photonic circuit can be evaluated by a single simulation only, without the need for repeated simulations. The accuracy and the significant speed-up with respect to the classical Monte Carlo analysis are verified by means of classical photonic circuit example with multiple uncertain variables.
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