Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III

doi:10.1117/1.3647513

1 October 2011 Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Philip C. W. Ng, Kuen-Yu Tsai, Lawrence S. Melvin III

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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 4, 049801 (October 2011). https://doi.org/10.1117/1.3647513

This PDF file contains the errata for “JM3 Vol. 10 Issue 04 Paper 3647513” for JM3 Vol. 10 Issue 04

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Philip C. W. Ng, Kuen-Yu Tsai, and Lawrence S. Melvin III "Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(4), 049801 (1 October 2011). https://doi.org/10.1117/1.3647513

Published: 1 October 2011

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