Dr. Philip C. W. Ng Profile

Dr. Philip C. W. Ng

at National Taiwan Univ

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 18 April 2013 Paper

Direct-scatterometry-enabled optical-proximity-correction-model calibration

Chih-Yu Chen, Philip C. W. Ng, Chun-Hung Liu, Yu-Tian Shen, Kuen-Yu Tsai, Jia-Han Li, Jason Shieh, Alek Chen

Proceedings Volume 8681, 86810U (2013) https://doi.org/10.1117/12.2009064

KEYWORDS: Calibration, Lithography, Optical proximity correction, Data modeling, Signal processing, Scatterometry, Process control, Photomasks, Process modeling, Systems modeling

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SPIE Journal Paper | 22 August 2012

New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints

Hoi-Tou Ng, Yu-Tian Shen, Sheng-Yung Chen, Chun-Hung Liu, Philip Ng, Kuen-Yu Tsai

JM3, Vol. 11, Issue 3, 033007, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.033007

KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

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SPIE Journal Paper | 1 October 2011

Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Kuen-Yu Tsai, Lawrence Melvin, Philip Ng

JM3, Vol. 10, Issue 04, 049801, (October 2011) https://doi.org/10.1117/12.10.1117/1.3647513

SPIE Journal Paper | 1 July 2011

Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Philip Ng, Kuen-Yu Tsai, Lawrence Melvin

JM3, Vol. 10, Issue 03, 033010, (July 2011) https://doi.org/10.1117/12.10.1117/1.3616043

KEYWORDS: Process modeling, Photomasks, Optical proximity correction, 3D modeling, Model-based design, Image processing, Image segmentation, 3D image processing, Data modeling, Computer simulations

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SPIE Journal Paper | 1 April 2011

Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Kuen-Yu Tsai, Yen-Min Lee, Alek Chen, Philip Ng, Fu-Min Wang, Jia-Han Li

JM3, Vol. 10, Issue 02, 029801, (April 2011) https://doi.org/10.1117/12.10.1117/1.3576188

SPIE Journal Paper | 1 January 2011

Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Philip Ng, Kuen-Yu Tsai, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, Alek Chen

JM3, Vol. 10, Issue 1, 013004, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533222

KEYWORDS: Photomasks, Model-based design, 3D modeling, Extreme ultraviolet, Optical proximity correction, Process modeling, Computer simulations, Projection lithography, Scanners, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2010

Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Hang Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

JM3, Vol. 9, Issue 04, 043003, (October 2010) https://doi.org/10.1117/12.10.1117/1.3503532

KEYWORDS: Extreme ultraviolet, Finite-difference time-domain method, Reflectivity, Refractive index, Scattering, Computer simulations, Silicon, Photomasks, Molybdenum, Surface roughness

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Proceedings Article | 3 April 2010 Paper

Model-based proximity effect correction for electron-beam direct-write lithography

Chun-Hung Liu, Pei-Lin Tien, Philip C. Ng, Yu-Tian Shen, Kuen-Yu Tsai

Proceedings Volume 7637, 76371V (2010) https://doi.org/10.1117/12.846706

KEYWORDS: Process modeling, Photoresist processing, Modulation, Scattering, Model-based design, Semiconducting wafers, Lithography, Electron beams, Electron beam direct write lithography, Laser scattering

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Proceedings Article | 4 March 2010 Paper

A non-delta-chrome OPC methodology for process models with three-dimensional mask effects

Philip C. Ng, Kuen-Yu Tsai, Chih-Hsien Tang, Lawrence Melvin

Proceedings Volume 7640, 76402P (2010) https://doi.org/10.1117/12.846687

KEYWORDS: Optical proximity correction, Photomasks, Process modeling, 3D modeling, Optical lithography, Lithography, Computer simulations, Integrated circuits, Integrated circuit design, Nonlinear dynamics

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Proceedings Article | 12 December 2009 Paper

Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Han Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

Proceedings Volume 7520, 75200W (2009) https://doi.org/10.1117/12.837150

KEYWORDS: Finite-difference time-domain method, Extreme ultraviolet, Computer simulations, Reflectivity, Refractive index, Error analysis, Scattering, Molybdenum, Silicon, Surface roughness

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Proceedings Article | 11 December 2009 Paper

A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Ting-Han Pei, Fu-Min Wang, Jia-Han Li, Alek Chen

Proceedings Volume 7520, 75200S (2009) https://doi.org/10.1117/12.837077

KEYWORDS: Photomasks, Model-based design, 3D modeling, Optical proximity correction, Semiconducting wafers, Computer simulations, Extreme ultraviolet, Process modeling, Extreme ultraviolet lithography, Image segmentation

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Proceedings Article | 4 December 2008 Paper

A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Philip Ng, Kuen-Yu Tsai, Shy-Jay Lin, Jeng-Homg Chen

Proceedings Volume 7140, 71401I (2008) https://doi.org/10.1117/12.804693

KEYWORDS: Monte Carlo methods, Scattering, Electron beam lithography, Silicon, Data modeling, Polymethylmethacrylate, Laser scattering, Direct write lithography, Computer simulations, Backscatter

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Proceedings Article | 7 March 2008 Paper

Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence

Yi-Sheng Su, Philip Ng, Kuen-Yu Tsai, Yung-Yaw Chen

Proceedings Volume 6924, 69243Z (2008) https://doi.org/10.1117/12.772397

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Feedback control, Model-based design, Resolution enhancement technologies, Diffusion, Image processing, Lithographic illumination, Process modeling

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Showing 5 of 13 publications

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