CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 9635 > Article
Paper
23 October 2015 EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?
Yoshinori Nagaoka, Junji Miyazaki
Author Affiliations +
Proceedings Volume 9635, Photomask Technology 2015; 963510 (2015) https://doi.org/10.1117/12.2208944
Event: SPIE Photomask Technology, 2015, Monterey, California, United States
Abstract
No abstract available.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Yoshinori Nagaoka and Junji Miyazaki "EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?", Proc. SPIE 9635, Photomask Technology 2015, 963510 (23 October 2015); https://doi.org/10.1117/12.2208944
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 7 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet
Photomasks
Extreme ultraviolet lithography
Lithography
Pellicles
Double patterning technology
Inspection
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top