Rapid Isothermal Processing (RIP) Of Dielectrics

R. Singh; F. Radpour

doi:10.1117/12.947394

16 August 1988 Rapid Isothermal Processing (RIP) Of Dielectrics

R. Singh, F. Radpour

Proceedings Volume 0945, Advanced Processing of Semiconductor Devices II; (1988) https://doi.org/10.1117/12.947394
Event: Advances in Semiconductors and Superconductors: Physics and Device Applications, 1988, Newport Beach, CA, United States

Abstract

Rapid isothermal processing (RIP) based on incoherent sources of light has emerged as a major semiconductor processing technique. In this paper, a review of our own and other works on the RIP of dielectrics is presented.

Citation Download Citation

R. Singh and F. Radpour "Rapid Isothermal Processing (RIP) Of Dielectrics", Proc. SPIE 0945, Advanced Processing of Semiconductor Devices II, (16 August 1988); https://doi.org/10.1117/12.947394

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