Aqueous-based thick photoresist removal for bumping applications

John C. Moore; Alex J. Brewer; Alman Law; Jared M. Pettit

doi:10.1117/12.2175826

20 March 2015 Aqueous-based thick photoresist removal for bumping applications

John C. Moore, Alex J. Brewer, Alman Law, Jared M. Pettit

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 942519 (2015) https://doi.org/10.1117/12.2175826
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Cleaning processes account for over 25% of processing in microelectronic manufacturing [1], suggesting electronics to be one of the most chemical intensive markets in commerce. Industry roadmaps exist to reduce chemical exposure, usage, and waste [2]. Companies are encouraged to create a safer working environment, or green factory, and ultimately become certified similar to LEED in the building industry [3]. A significant step in this direction is the integration of aqueous-based photoresist (PR) strippers which eliminate regulatory risks and cut costs by over 50%. One of the largest organic solvent usages is based upon thick PR removal during bumping processes [4-6]. Using market projections and the benefits of recycling, it is estimated that over 1,000 metric tons (mt) of residuals originating from bumping processes are incinerated or sent to a landfill. Aqueous-based stripping would eliminate this disposal while also reducing the daily risks to workers and added permitting costs. Positive-tone PR dissolves in aqueous strippers while negative-tone systems are lifted-off from the substrate, bumps, pillars, and redistribution layers (RDL). While the wafers are further processed and rinsed, the lifted-off PR is pumped from the tank, collected onto a filter, and periodically back-flushed to the trash. The PR solids become a non-hazardous plastic waste while the liquids are mixed with the developer stream, neutralized, filtered, and in most cases, disposed to the sewer. Regardless of PR thickness, removal processes may be tuned to perform in <15min, performing at rates nearly 10X faster than solvents with higher bath lives. A balanced formula is safe for metals, dielectrics, and may be customized to any fab.

Citation Download Citation

John C. Moore, Alex J. Brewer, Alman Law, and Jared M. Pettit "Aqueous-based thick photoresist removal for bumping applications", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942519 (20 March 2015); https://doi.org/10.1117/12.2175826

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