Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna; Omar Zurita; Ivan Lalovic; Nakgeuon Seong; Gregory Rechsteiner; Joshua Thornes; Koen D'havé; Lieve Van Look; Joost Bekaert

doi:10.1117/12.2013213

12 April 2013 Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Author Affiliations +

Proceedings Volume 8683, Optical Microlithography XXVI; 86830S (2013) https://doi.org/10.1117/12.2013213
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Reducing lithography pattern variability has become a critical enabler of ArF immersion scaling and is required to ensure consistent lithography process yield for sub-30nm device technologies. As DUV multi-patterning requirements continue to shrink, it is imperative that all sources of lithography variability are controlled throughout the product life-cycle, from technology development to high volume manufacturing. Recent developments of new ArF light-source metrology and monitoring capabilities have been introduced in order to improve lithography patterning control.^[1] These technologies enable performance monitoring of new light-source properties, relating to illumination stability, and enable new reporting and analysis of in-line performance.

Citation Download Citation

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , and Joost Bekaert "Lithography imaging control by enhanced monitoring of light source performance", Proc. SPIE 8683, Optical Microlithography XXVI, 86830S (12 April 2013); https://doi.org/10.1117/12.2013213

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