Productivity of femtosecond DUV laser photomask repair in a real world mask house

Jin-Hong Lin; C. Y. Chen; F. G. Tsai; Tod Robinson; Daniel Yi; Jeff LeClaire; Roy White; Ron Bozak; Mike Archuletta

doi:10.1117/12.898502

13 October 2011 Productivity of femtosecond DUV laser photomask repair in a real world mask house

Jin-Hong Lin, C. Y. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta

Proceedings Volume 8166, Photomask Technology 2011; 81662X (2011) https://doi.org/10.1117/12.898502
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

A number of new technologies and processes have been developed for deep ultraviolet (DUV) wavelength and femtosecond pulsed laser repair of photomasks. These advances have been shown to improve and extend the repair of both pelliclized and non-pellicilized photomasks for both hard and soft (or nano-particle) in exhaustive testing at the factory and the end-user site. However, even the best testing is only a simulation of what a repair tool will see when brought into full production. The purpose of this work is to review some of the knowledge and experience gained in bringing the repair processes defined with manufactured defects to the more variable defects encountered in the real world. The impact of the repair technology on increases in mask house throughput and decrease in costs will also be compared to other (another laser and an advanced FIB) repair tools.

Citation Download Citation

Jin-Hong Lin, C. Y. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, and Mike Archuletta "Productivity of femtosecond DUV laser photomask repair in a real world mask house", Proc. SPIE 8166, Photomask Technology 2011, 81662X (13 October 2011); https://doi.org/10.1117/12.898502

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