Application of pixel-based mask optimization technique for high transmission attenuated PSM

Kyohei Sakajiri; Alexander Trichkov; Yuri Granik; Eric Hendrickx; Geert Vandenberghe; Monica Kempsell; Germain Fenger; Klaus Boehm; Thomas Scheruebl

doi:10.1117/12.813753

12 March 2009 Application of pixel-based mask optimization technique for high transmission attenuated PSM

Kyohei Sakajiri, Alexander Trichkov, Yuri Granik, Eric Hendrickx, Geert Vandenberghe, Monica Kempsell, Germain Fenger, Klaus Boehm, Thomas Scheruebl

Author Affiliations +

Proceedings Volume 7275, Design for Manufacturability through Design-Process Integration III; 72750X (2009) https://doi.org/10.1117/12.813753
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Sub-resolution assist features (SRAF) insertion using mask synthesis process based on pixel-based mask optimization schemes has been studied in recent years for various lithographical schemes, including 6% attenuated PSM (AttPSM) with off-axis illumination. This paper presents results of application of the pixelbased optimization technology to 6% and 30% AttPSM mask synthesis. We examine imaging properties of mask error enhancement factor (MEEF), critical dimension (CD) uniformity, and side-lobe printing for random contact hole patterns. We also discuss practical techniques for manipulating raw complex shapes generated by the pixel-based optimization engine that ensure mask manufacturability.

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Kyohei Sakajiri, Alexander Trichkov, Yuri Granik, Eric Hendrickx, Geert Vandenberghe, Monica Kempsell, Germain Fenger, Klaus Boehm, and Thomas Scheruebl "Application of pixel-based mask optimization technique for high transmission attenuated PSM", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750X (12 March 2009); https://doi.org/10.1117/12.813753

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