Cluster optimization to improve CD control as an enabler for double patterning

Len Tedeschi; Craig Rosslee; David Laidler; Philippe Leray; Koen D'havé

doi:10.1117/12.805239

4 December 2008 Cluster optimization to improve CD control as an enabler for double patterning

Len Tedeschi, Craig Rosslee, David Laidler, Philippe Leray, Koen D'havé

Proceedings Volume 7140, Lithography Asia 2008; 714023 (2008) https://doi.org/10.1117/12.805239
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

Given the increasingly stringent CD requirements for double patterning at the 32nm node and beyond, the question arises as to how best to correct for CD non-uniformity at litho and etch. For example, is it best to apply a dose correction over the wafer while keeping the PEB plate as uniform as possible, or should the dose be kept constant and PEB plate tuning used to correct. In this paper we present experimental data using both of these approaches, obtained on an ASML XT:1900Gi and Sokudo RF^3S cluster.

Citation Download Citation

Len Tedeschi, Craig Rosslee, David Laidler, Philippe Leray, and Koen D'havé "Cluster optimization to improve CD control as an enabler for double patterning", Proc. SPIE 7140, Lithography Asia 2008, 714023 (4 December 2008); https://doi.org/10.1117/12.805239

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