Status of two-color and large format HgCdTe FPA technology at Raytheon Vision Systems

E. P. G. Smith; R. E. Bornfreund; I. Kasai; L. T. Pham; E. A. Patten; J. M. Peterson; J. A. Roth; B. Z. Nosho; T. J. De Lyon; J. E. Jensen; J. W. Bangs; S. M. Johnson; W. A. Radford

doi:10.1117/12.666668

28 February 2006 Status of two-color and large format HgCdTe FPA technology at Raytheon Vision Systems

E. P. G. Smith, R. E. Bornfreund, I. Kasai, L. T. Pham, E. A. Patten, J. M. Peterson, J. A. Roth, B. Z. Nosho, T. J. De Lyon, J. E. Jensen, J. W. Bangs, S. M. Johnson, W. A. Radford

Author Affiliations +

Proceedings Volume 6127, Quantum Sensing and Nanophotonic Devices III; 61271F (2006) https://doi.org/10.1117/12.666668
Event: Integrated Optoelectronic Devices 2006, 2006, San Jose, California, United States

Abstract

Raytheon Vision Systems (RVS) is developing two-color and large format single color FPAs fabricated from molecular beam epitaxy (MBE) grown HgCdTe triple layer heterojunction (TLHJ) wafers on CdZnTe substrates and double layer heterojunction (DLHJ) wafers on Si substrates, respectively. MBE material growth development has resulted in scaling TLHJ growth on CdZnTe substrates from 10cm² to 50cm², long-wavelength infrared (LWIR) DLHJ growth on 4-inch Si substrates and the first demonstration of mid-wavelength infrared (MWIR) DLHJ growth on 6-inch Si substrates with low defect density (<1000cm^-2) and excellent uniformity (composition<0.1%, cut-off wavelength Δcenter-edge<0.1μm). Advanced FPA fabrication techniques such as inductively coupled plasma (ICP) etching are being used to achieve high aspect ratio mesa delineation of individual detector elements with benefits to detector performance. Recent two-color detectors with MWIR and LWIR cut-off wavelengths of 5.5μm and 10.5μm, respectively, exhibit significant improvement in 78K LW performance with >70% quantum efficiency, diffusion limited reverse bias dark currents below 300pA and RA products (zero field-of-view, +150mV bias) in excess of 1×103 Ωcm². Two-color 20μm unit-cell 1280×720 MWIR/LWIR FPAs with pixel response operability approaching 99% have been produced and high quality simultaneous imaging of the spectral bands has been achieved by mating the FPA to a readout integrated circuit (ROIC) with Time Division Multiplexed Integration (TDMI). Large format mega pixel 20μm unit-cell 2048×2048 and 25μm unit-cell 2560×512 FPAs have been demonstrated using DLHJ HgCdTe growth on Si substrates in the short wavelength infrared (SWIR) and MWIR spectral range. Recent imaging of 30μm unit-cell 256×256 LWIR FPAs with 10.0-10.7μm 78K cut-off wavelength and pixel response operability as high as 99.7% show the potential for extending HgCdTe/Si technology to LWIR wavelengths.

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E. P. G. Smith, R. E. Bornfreund, I. Kasai, L. T. Pham, E. A. Patten, J. M. Peterson, J. A. Roth, B. Z. Nosho, T. J. De Lyon, J. E. Jensen, J. W. Bangs, S. M. Johnson, and W. A. Radford "Status of two-color and large format HgCdTe FPA technology at Raytheon Vision Systems", Proc. SPIE 6127, Quantum Sensing and Nanophotonic Devices III, 61271F (28 February 2006); https://doi.org/10.1117/12.666668

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