Large-format IRFPA development on silicon

Nibir K. Dhar; Meimei Z. Tidrow

doi:10.1117/12.562812

22 October 2004 Large-format IRFPA development on silicon

Nibir K. Dhar, Meimei Z. Tidrow

Proceedings Volume 5564, Infrared Detector Materials and Devices; (2004) https://doi.org/10.1117/12.562812
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

High performance large-format Infrared Focal Plane Arrays are required for Third Generation Infrared Imaging technology. HgCdTe IRFPAs exhibit performances to meet this goal. Si-based composite substrates have proven to be the substrate of choice to realize high-resolution HgCdTe arrays. Composite substrate technology offers scalability, and wafer sizes as large as six-inches have been used with excellent compositional uniformity. Current state-of-the-art composite substrates exhibits dislocation density in low to mid 10⁵ cm^-2 range. The HgCdTe epitaxial layers on composite substrates, however, show a defect density in the low to mid 10⁶ cm^-2. Recent developments in CdSeTe/Si composite wafers show great promise for a better lattice matching to HgCdTe alloy, and it is envisioned that with further improvements in both, materials quality and device architecture, a HgCdTe based scalable technology is within our grasp.

Citation Download Citation

Nibir K. Dhar and Meimei Z. Tidrow "Large-format IRFPA development on silicon", Proc. SPIE 5564, Infrared Detector Materials and Devices, (22 October 2004); https://doi.org/10.1117/12.562812

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