Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting

Bahram Jalali; Prakash Koonath; Tejaswi Indukuri

doi:10.1117/12.590863

25 March 2005 Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting

Bahram Jalali, Prakash Koonath, Tejaswi Indukuri

Proceedings Volume 5729, Optoelectronic Integrated Circuits VII; (2005) https://doi.org/10.1117/12.590863
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

A new process has been developed to create vertically-integrated photonic and optoelectronic circuits in silicon. The approach is the 3-D extension of the SIMOX process where buried SiO2 sections can be selectively created by using oxygen implantation, through a mask, followed by annealing. By controlling the implant energy, dose, mask area and thickness, arbitrary 3-D arrangements of Silicon/SiO2 can be created. The process has been used to create vertically coupled microdisk resonators and add-drop wavelength multiplexers on a silicon wafer.

Citation Download Citation

Bahram Jalali, Prakash Koonath, and Tejaswi Indukuri "Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting", Proc. SPIE 5729, Optoelectronic Integrated Circuits VII, (25 March 2005); https://doi.org/10.1117/12.590863

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available