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A novel fabrication strategy has produced optical microring-resonator-based thermal detectors. The detectors are based
on the thermo-optic effect and are thermally isolated from a silicon wafer substrate so as to maximize the temperature
excursion for a given amount of incident radiation and minimize the impact of thermal phonon noise. The combination
of high-Q, thermal isolation, and lack of Johnson noise offers thermal microphotonic detectors the potential to achieve
significantly greater room temperature sensitivity than standard bolometric techniques. Several batch fabrication
strategies were investigated for producing thermal microphotonic detectors using waveguide materials such as LPCVD
Silicon Nitride (Si3N4) on Oxide and Silicon on Insulator (SOI). Fabrication challenges and loss reduction strategies will
be presented along with some initial infrared detection results.
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Michael J. Shaw, Michael R. Watts, Gregory N. Nielson, "Fabrication techniques for creating a thermally isolated TM-FPA (thermal microphotonic focal plane array)," Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 688308 (6 February 2008); https://doi.org/10.1117/12.764632