Paper
6 December 2004 Phase-defocus windows for alternating phase-shifting mask
Author Affiliations +
Abstract
We propose a useful methodology, called phase-defocus (P-D) window, to express the mutual dependence of Alt-PSM mask structure and the wafer process window of the pattern-position shift caused by phase error and intensity imbalance. The P-D window was predicted and optimized with a 2-D mask with effective phase and transmission by simulations. We further used rigorous E-M field simulations to correlate the 3-D mask structure to those optimized conditions. Moreover, experiments were performed with four kinds of mask structures and the best Alt-PSM structure was obtained and used to suggest the mask fabrication performance based on P-D window analysis. In order to understand the influence of mask fabrication on patterns with various densities, the common P-D window is proposed. Using the P-D window, the optimized condition was achieved with a maximum process margin for the mask and wafer. In addition, the P-D window is used to quantify the scattering effect coming from the topographical mask and determine the effective 180° for the iso-focal condition.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fu-Jye Liang, Chun-Kuang Chen, Jaw-Jung Shin, Jan-Wen You, Chun-Heng Lin, Zhin-Yu Pan, King-Chang Shu, Tsai-Sheng Gau, and Burn J. Lin "Phase-defocus windows for alternating phase-shifting mask", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569216
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KEYWORDS
Photomasks

Semiconducting wafers

Phase shifting

Phase shifts

Etching

Mask making

Optical lithography

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