CONFERENCE PROCEEDINGS
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Jan-Wen You
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (4)
Proceedings Article | 6 December 2004 Paper
Phase-defocus windows for alternating phase shifting mask
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569216
KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making
Proceedings Article | 20 August 2004 Paper
Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557745
KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Laser energy, Image processing, Electron beam lithography, Semiconducting wafers, Optical simulations, Optical proximity correction, Convolution
Proceedings Article | 28 August 2003 Paper
Pattern-dependence optical phase effect on alternating phase shift mask
Bin-Chang Chang, Jan-Wen You, Ming Lu, Chiu-Lien Lee, Li-Wei Kung, King-Chang Shu, Jaw-Jung Shin, Tsai-Sheng Gau, Burn-Jeng Lin
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504284
KEYWORDS: Photomasks, Quartz, Etching, Chromium, Phase shifts, Wet etching, Reactive ion etching, Semiconducting wafers, Mask making, Resolution enhancement technologies
Proceedings Article | 27 December 2002 Paper
Alt-PSM of contact with phase-assist feature for 65-nm node
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467499
KEYWORDS: Photomasks, Resolution enhancement technologies, Etching, Wet etching, Optical lithography, Dry etching, Semiconducting wafers, Chromium, Reticles, Phase shifts
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