Dry cleaning of fluorocarbon residues by atomic hydrogen flow

E. Anishchenko; V. Diamant; Valerii A. Kagadei; E. Nefeyodtsev; Dmitry I. Proskurovsky; S. Romanenko

doi:10.1117/12.557271

28 May 2004 Dry cleaning of fluorocarbon residues by atomic hydrogen flow

E. Anishchenko, V. Diamant, Valerii A. Kagadei, E. Nefeyodtsev, Dmitry I. Proskurovsky, S. Romanenko

Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.557271
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation

Abstract

Successful removal of fluorocarbon residues on silicon structure using neutral atomic hydrogen direct flow is reported. It has been stated that the treatment of samples in atomic hydrogen direct flow of density of 2x10¹⁵ at. cm^-2 s^-1 leads to decreasing of fluorocarbon residues concentration on the surface of structure by 5 orders of magnitude. The concentration of fluorocarbon residues after AH treatment is at the hum level characteristic for the absolutely clean surface exposed in atmosphere air. Removal fluorocarbon residues is being realized at temperature of 20-100 ° both from the planar surface of a structure and from the sidewalls and bottom of the contact holes with diameter of 0.3-0.25 μm and depth of 1.2-1 μm. The time of treatment as 2 min is quite sufficient for fluorocarbon residues removal.

Citation Download Citation

E. Anishchenko, V. Diamant, Valerii A. Kagadei, E. Nefeyodtsev, Dmitry I. Proskurovsky, and S. Romanenko "Dry cleaning of fluorocarbon residues by atomic hydrogen flow", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.557271

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