Detection method for a T-topped profile in resist patterns by CD-SEM

Atsuko Yamaguchi; Hiroshi Fukuda; Osamu Komuro; Shozo Yoneda; Takashi Iizumi

doi:10.1117/12.534618

24 May 2004 Detection method for a T-topped profile in resist patterns by CD-SEM

Atsuko Yamaguchi, Hiroshi Fukuda, Osamu Komuro, Shozo Yoneda, Takashi Iizumi

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.534618
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A new method of detecting a T-topped profile in resist patterns is described. This method can determine a T-topped tendency from only a single top-down CD-SEM image. The idea is based on the relationship between the cross-sectional pattern profile and the shape of the bright area near the pattern edge in the top-down image. Two kinds of index for a T-topped tendency are defined using line-edge roughness, width of the bright area, and the correlation coefficient between the left and right borders of the area. Both indices agreed well with actual cross-sectional profiles of various resist patterns. In addition, it is found that these indices can be used to estimate defocus in the photolithography process.

Citation Download Citation

Atsuko Yamaguchi, Hiroshi Fukuda, Osamu Komuro, Shozo Yoneda, and Takashi Iizumi "Detection method for a T-topped profile in resist patterns by CD-SEM", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.534618

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