EUV generation using water droplet target

Jing Quan Lin; Hidehiko Yashiro; Tatsuya Aota; Toshihisa Tomie

doi:10.1117/12.534708

20 May 2004 EUV generation using water droplet target

Jing Quan Lin, Hidehiko Yashiro, Tatsuya Aota, Toshihisa Tomie

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.534708
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this paper, we described a laser plasma source for Extreme Ultraviolet Lithography (EUVL) based on a water droplet target. We successfully generated stable multi-kHz water droplets with several hundred μm diameter using our experimentaql setup. We realized a good synchronization of laser with droplet by employing droplet-probing photo diode (PD) signal to trig YAG laser timely. We got EUV emission with pulse to pulse stability of 3.4% (1σ) from this droplet region without being destroyed due to hot laser plasma formation from the previous droplet.

Citation Download Citation

Jing Quan Lin, Hidehiko Yashiro, Tatsuya Aota, and Toshihisa Tomie "EUV generation using water droplet target", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.534708

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