Paper
15 December 2003 Study of P-type carbon doping on In0.53Ga0.47As, In0.52Al0.2Ga0.28As, and In0.52Al0.48As
J. Yan, G. Ru, Y. Gong, Fow-Sen Choa
Author Affiliations +
Proceedings Volume 5260, Applications of Photonic Technology 6; (2003) https://doi.org/10.1117/12.543715
Event: Applications of Photonic Technology, 2003, Quebec City, Québec, Canada
Abstract
The incorporation of carbon into In0.53Ga0.47As, In0.52Al0.48As and In0.52Al0.2Ga0.28As lattice matched to InP was investigated using carbon tetrabromide (CBr4) as the carbon source in Metalorganic Chemical Vapor Depositions growth. The parameters and growth conditions are optimized to get high p-type doping for photonic device applications. This is among the first few studies on C-doping in InAlAs and InAlGaAs, and the results show that the presence of Al also efficiently helps to obtain high p-type carbon doping.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Yan, G. Ru, Y. Gong, and Fow-Sen Choa "Study of P-type carbon doping on In0.53Ga0.47As, In0.52Al0.2Ga0.28As, and In0.52Al0.48As", Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); https://doi.org/10.1117/12.543715
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KEYWORDS
Carbon

Doping

Indium gallium arsenide

Aluminum

Chemical species

Gallium

Metalorganic chemical vapor deposition

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