Taking advantage of vendor automation with SEMI P10

Mike Behnam; Jim McCracken

doi:10.1117/12.518222

17 December 2003 Taking advantage of vendor automation with SEMI P10

Mike Behnam, Jim McCracken

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518222
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

Although the first version of the SEMI P10 “Specification of Data Structures for Photomask Orders” was introduced over ten years ago and is supported by all of the major photomask vendors, only a few chip suppliers currently take advantage of this automated order entry infrastructure. This is unfortunate because placing a photomask order by transmitting a P10 file reduces errors and improves throughput time. The hierarchical structure and comprehensive support for fracturing software, writing tools, defect inspection systems, and metrology equipment, allow tapeout groups to define very complex photomask orders in a P10 file. Mix and match reticle sets utilizing multiple steppers, multi-layer reticles, process development reticles with dozens of pattern files per layer, and phase shift reticles can all be defined in a P10 file. However, the extensive capabilities and the scalability of SEMI P10 come at a price. The specification is complicated -- the latest release is over 40 pages in length and defines over 500 record types. Before a software system that automates P10 file writing can be successfully implemented, the P10 spec must be studied from a number of perspectives. These include the user interface requirements, present and future photomask needs, vendor preferences for P10 file structure and content, and process file management. This paper will present a brief overview of the P10 structure and capabilities, describe how Agilent Technologies, Photomask Technology Center (PTC) made the decision to upgrade its reticle order management software with RetBuilder from CenterLink.

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Mike Behnam and Jim McCracken "Taking advantage of vendor automation with SEMI P10", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518222

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KEYWORDS

Photomasks

Reticles

Human-machine interfaces

Inspection

Standards development

Manufacturing

Software development

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