Mask industry assessment: 2002

Kurt R. Kimmel

doi:10.1117/12.467389

27 December 2002 Mask industry assessment: 2002

Kurt R. Kimmel

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467389
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. This assessment can be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of our critical mask industry. It should serve as a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

Citation Download Citation

Kurt R. Kimmel "Mask industry assessment: 2002", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467389

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