Factors influencing CD-SEM metrology

Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt

doi:10.1117/12.473447

16 July 2002 Factors influencing CD-SEM metrology

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473447
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Nanometrology LLC has developed a unique set of solutions for optimizing CD-SEM metrology by improving signal to noise ratio and quantifying scan non-linearity. Examples of Nanometrology's solutions for improved CD-SEM magnification calibration are demonstrated using CD-SEMs from a variety of user sites. To our knowledge, this is the first time that a method to quantify CD-SEM scan non-linearity with precision 0.1 percent has been reported. Calibration precision of 0.1 percent or better can be achieved on both cross-section and CD-SEMs to enable them to meet or exceed the requirements of the ITRS roadmap beyond 2014.

Citation Download Citation

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Factors influencing CD-SEM metrology", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473447

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