MEMS-based precision motion control approach to high-throughput-rate electron beam lithography

J. Geoffrey Chase; Bram W. Smith

doi:10.1117/12.449002

21 November 2001 MEMS-based precision motion control approach to high-throughput-rate electron beam lithography

J. Geoffrey Chase, Bram W. Smith

Proceedings Volume 4592, Device and Process Technologies for MEMS and Microelectronics II; (2001) https://doi.org/10.1117/12.449002
Event: International Symposium on Microelectronics and MEMS, 2001, Adelaide, Australia

Abstract

The ever-increasing drive to fabricate Integrated Circuits (IC's) with smaller feature sizes is stretching the capabilities of today's optical lithography methods. Current techniques are becoming less scalable, with incremental improvements in resolution requiring ever increasing research and investment. New technologies are appearing, enabling conventional, optical micro-fabrication techniques to be replaced with simpler, scalable methods, revolutionizing IC fabrication. An alternative approach to sub-50nm lithography is presented utilizing the features of smart materials and Micro-Electro-Mechanical Systems (MEMS) technology. MEMS fabricated arrays of electron beam emitters offer the resolution and scalability of Multi-column Electron Beam Lithography (MEBL), while overcoming traditional limitations in production rate, optical complexity and beam current. Critical tradeoffs between significant variables are developed that show the feasibility of the proposed reference design. The proposed method consists of a highly parallel, multi-column EBL system with a production rate from 10-60 wafers/hr at 50nm resolution, and is shown to be feasible with near-term evolution in specific technologies. This solution exploits converging technologies in smart materials, MEMS and precision motion control, to overcome the limitations faced by current EBL approaches.

Citation Download Citation

J. Geoffrey Chase and Bram W. Smith "MEMS-based precision motion control approach to high-throughput-rate electron beam lithography", Proc. SPIE 4592, Device and Process Technologies for MEMS and Microelectronics II, (21 November 2001); https://doi.org/10.1117/12.449002

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available