Sophisticated masks

Roger Fabian W. Pease; Gerry Owen; Raymond Browning; Robert L. Hsieh; Julienne Yu-Hey Lee; Nadim I. Maluf; C. Neil Berglund

doi:10.1117/12.29747

1 March 1991 Sophisticated masks

Roger Fabian W. Pease, Gerry Owen, Raymond Browning, Robert L. Hsieh, Julienne Yu-Hey Lee, Nadim I. Maluf, C. Neil Berglund

Author Affiliations +

Proceedings Volume 1496, 10th Annual Symp on Microlithography; (1991) https://doi.org/10.1117/12.29747
Event: 10th Annual Symposium on Microlithography, 1990, Sunnyvale, CA, United States

Abstract

Most photolithographic masks are made today using technology that has charged little from that licensed to the industry by Western Electric in 1975; even X-ray lithographic masks have changed little since then. This at first sight is extraordinary given that this same period spans the evolution of DRAMs by three orders of magnitude (from 4Kbit to 4M-bit) and the reduction of feature sizes nearly one order of magnitude.

Citation Download Citation

Roger Fabian W. Pease, Gerry Owen, Raymond Browning, Robert L. Hsieh, Julienne Yu-Hey Lee, Nadim I. Maluf, and C. Neil Berglund "Sophisticated masks", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); https://doi.org/10.1117/12.29747

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