High-performance vs. low-power technology roadmaps: how are they different?

Dirk Wristers

doi:10.1117/12.395722

18 August 2000 High-performance vs. low-power technology roadmaps: how are they different?

Dirk Wristers

Proceedings Volume 4181, Challenges in Process Integration and Device Technology; (2000) https://doi.org/10.1117/12.395722
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

The effectiveness of a platform development approach for next general logic technologies is discussed. Of the critical material changes that are being considered for the 0.1 micrometers technology generation and beyond, high k gate dielectrics will be driven by low power technology needs while low k and SOI technology enhancements will be driven by high performance technology requirements along with other technology 'extras'. The result is less overlap in technology requirements for low power logic technology relative to high performance logic technology at the immediate technology generation in question, but increased early learning for the following generation.

Citation Download Citation

Dirk Wristers "High-performance vs. low-power technology roadmaps: how are they different?", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); https://doi.org/10.1117/12.395722

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