High-intensity monochromatic x-ray beam using doubly curved crystal optics

Zewu Chen; Jeffrey P. Nicolich

doi:10.1117/12.405886

2 November 2000 High-intensity monochromatic x-ray beam using doubly curved crystal optics

Zewu Chen, Jeffrey P. Nicolich

Proceedings Volume 4144, Advances in Laboratory-based X-Ray Sources and Optics; (2000) https://doi.org/10.1117/12.405886
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Doubly curved crystals of Mica, Ge and Si were bent according to Johann-Geometry. Point-to-point focusing of characteristic x-rays can be used to create a highly intense focal spot (50 micrometers FWHM) of 6.7 X 10⁸ photons/s using a doubly curved Ge crystal and a 15 W Cr x-ray source. The output focal spot size was shown to be dependent on the spot size of the source. Focal spots of less than 50 micrometers were achieved. Doubly curved crystals have useful properties for monochromatic micro x-ray fluorescence measurements.

Citation Download Citation

Zewu Chen and Jeffrey P. Nicolich "High-intensity monochromatic x-ray beam using doubly curved crystal optics", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405886

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