Modeling the effects of excimer laser bandwidths on lithographic performance

Armen Kroyan; Joseph J. Bendik; Olivier Semprez; Nigel R. Farrar; Christopher G. Rowan; Chris A. Mack

doi:10.1117/12.389057

5 July 2000 Modeling the effects of excimer laser bandwidths on lithographic performance

Armen Kroyan, Joseph J. Bendik, Olivier Semprez, Nigel R. Farrar, Christopher G. Rowan, Chris A. Mack

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389057
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide tow of the main characteristics required of a light source for high- resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration in the imaging lens, even the very narrow bandwidth of an excimer laser may lead to image degradation.

Citation Download Citation

Armen Kroyan, Joseph J. Bendik, Olivier Semprez, Nigel R. Farrar, Christopher G. Rowan, and Chris A. Mack "Modeling the effects of excimer laser bandwidths on lithographic performance", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389057

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