Numerical optimization method for semiconductor diffusion recipe programming

Paul T. McGuire

doi:10.1117/12.284629

25 August 1997 Numerical optimization method for semiconductor diffusion recipe programming

Paul T. McGuire

Proceedings Volume 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III; (1997) https://doi.org/10.1117/12.284629
Event: Microelectronic Manufacturing, 1997, Austin, TX, United States

Abstract

This paper describes the development of a standard diffusion recipe model and its use within a numerical optimization method to obtain time-optimal diffusion recipes, within nonlinear temperature-dependent constraints. The diffusion model and optimization program have been packaged as a diffusion process engineering tool, which can be applied to optimize existing diffusion recipes, thereby reducing processing time in production. Equivalence of diffusion recipes is demonstrated using commercial diffusion simulation software, on both unoptimized and optimized recipes.

Citation Download Citation

Paul T. McGuire "Numerical optimization method for semiconductor diffusion recipe programming", Proc. SPIE 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, (25 August 1997); https://doi.org/10.1117/12.284629

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available