Tailoring of a photoactive compound for non-chemically amplified 248-nm resist formulations

Michael J. Leeson; Adam Richard Pawloski; Vrad Levering; Wang Yueh; C. Grant Willson

doi:10.1117/12.275887

7 July 1997 Tailoring of a photoactive compound for non-chemically amplified 248-nm resist formulations

Michael J. Leeson, Adam Richard Pawloski, Vrad Levering, Wang Yueh, C. Grant Willson

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275887
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Several approaches toward the design of non-chemically amplified deep UV resists have been reported using different photoactive compounds and resins. Diazo-dione chromophores are particularly attractive for this application, but the keto- ketenes derived from their photolysis are more reactive than those derived from the analogous diazonaphthoquinones. Specifically, the 30-diazo-4-ketocoumarin chromophore has been identified as a promising candidate around which to design a non-chemically amplified 248 nm resist. In order to optimize the design of this system, the influence of both electronic and steric influences on the rate of reaction of the ketene with novolac resin has been studied. These experiments were carried out using a low temperature matrix isolation FT-IR technique similar to that previously reported. The reaction of the ketene with the resin hydroxyl group follows pseudo first order kinetics and the rate constant is dependent on the substituents and the substitution pattern on the coumarin.

Citation Download Citation

Michael J. Leeson, Adam Richard Pawloski, Vrad Levering, Wang Yueh, and C. Grant Willson "Tailoring of a photoactive compound for non-chemically amplified 248-nm resist formulations", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275887

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