Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle

Yonghoon Kim; Jin-Hong Park; Kyung Hee Lee; Hanku Cho; Hee-Sun Yoon

doi:10.1117/12.262840

27 December 1996 Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle

Yonghoon Kim, Jin-Hong Park, Kyung Hee Lee, Hanku Cho, Hee-Sun Yoon

Author Affiliations +

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262840
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

As field size is increased and design rule goes down to O.l8pm, more tight control of defects on the reticle is required than before. T his requirement is m ore critical on contact patterns than line and space(L/S) patterns in the case of the same size of defect. In this paper, test reticles which have background normal contact patterns and background OPC(optical Proximity Correction) contact patterns, respectively, have been investigated for 256M DRAM level. We included a wide variety of programmed defects in background patterns. The geometry of the background contact patterns on the reticle has been designed for 0.3 1 pm m ore or less when printed on a wafer with a 4X reduction stepper. The programmed defects are used for the sensitivity evalution of a defect inspection system, i.e, detectability. Also printability of these defects on the wafer is performed by using a 4X reduction DUV(248nm) stepper to deterrn me not only the reticle defect specification but also the detectability required for the defect inspection system. Test results are as follows: First, the defect specifications required for 256M DRAM can be determined. Second, OPC contact patterns have better wafer results than normal contact patterns in view of depth of focus(DOF) and defect printability. Third, inspection technique for OPC patterns remains the task to be solved. Keywords : detectability, printability, programmed defect, OPC, DOF, serif, simulation

Citation Download Citation

Yonghoon Kim, Jin-Hong Park, Kyung Hee Lee, Hanku Cho, and Hee-Sun Yoon "Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262840

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
14 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Reticles

Optical proximity correction

Semiconducting wafers

Defect detection

Defect inspection

Inspection

Photomasks

Show All Keywords

Keywords/Phrases

Search In:

Publication Years