Toward a commercial gas field ion source

William B. Thompson; A. Armstrong; S. Etchin; Raymond Hill; Sigfried Kalbitzer; R. Percival; A. Saxonis; Christoph Wilbertz

doi:10.1117/12.209185

19 May 1995 Toward a commercial gas field ion source

William B. Thompson, A. Armstrong, S. Etchin, Raymond Hill, Sigfried Kalbitzer, R. Percival, A. Saxonis, Christoph Wilbertz

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209185
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Focused ion beam systems have traditionally used liquid gallium as the ion source material. It may now be possible to have high current density focused beams of gas ions like hydrogen, helium, neon, and oxygen. This paper discusses the progress recently made toward the commercialization of an alternative to gallium, the gas field ion source, or GFIS.

Citation Download Citation

William B. Thompson, A. Armstrong, S. Etchin, Raymond Hill, Sigfried Kalbitzer, R. Percival, A. Saxonis, and Christoph Wilbertz "Toward a commercial gas field ion source", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209185

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available