New ring array off-axis illumination system for subhalf-micron lithography

Haixing Zou; Qihua Yan; Yu Yan

doi:10.1117/12.150428

8 August 1993 New ring array off-axis illumination system for subhalf-micron lithography

Haixing Zou, Qihua Yan, Yu Yan

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150428
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We have studied a new model excimer laser illumination system used in sub-half-micron lithography to improve optical lithography resolution. This system consists of a KrF excimer laser, laser beam expander, axicon-lens, ring-array-lens, aperture stop and field lenses. In the system, an expanded excimer laser beam is focused on a ring which is in the focus of the axicon-lens. The ring-array-lens situated at the ring beam is used as a laser beam uniformizer. And finally, the ring beam is imaged on the aperture stop of the projective lens by field lenses. This is a special off-axis illumination system. The image distribution of mask pattern on the wafer become sharper than that of general illumination systems. Eighty percent of excimer laser energy can be used in an exposure wafer without energy loss in the projective lens. On the mask, the uniformity of illumination obtained is less than 2 percent and the system can be used in 150 nm - 300 nm deep UV region optical lithography.

Citation Download Citation

Haixing Zou, Qihua Yan, and Yu Yan "New ring array off-axis illumination system for subhalf-micron lithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150428

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