Paper
20 December 2019 Partial coherence measurement for the illumination system in excimer laser lithography based on CCD image sensor
Pei Lu, Xiaoyong Liu, Qin Shi, Jianxin Shao, Yongcai Zhang, Zhenzhen Zheng
Author Affiliations +
Proceedings Volume 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019); 112091V (2019) https://doi.org/10.1117/12.2547679
Event: Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 2019, Xi'an, China
Abstract
Partial coherence is one of the important parameters for evaluating the performance of lithographic tool. In this paper, we present a novel method of partial coherence measurement for the illumination system based on CCD image sensor. Partial coherence measurement can be performed by using a pinhole placed in the mask plane under different illumination system. We simulate the light source image of different illumination pupil distributions as well as the energy center by determining the gray value of spot. We show measurement values and measurement errors of partial coherence for illumination system. The statistics of the measurement results and the sensitivity analysis of the system indicate that measurement values and measurement errors of partial coherence satisfy the measurement requirement from our method in the wafer plane.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pei Lu, Xiaoyong Liu, Qin Shi, Jianxin Shao, Yongcai Zhang, and Zhenzhen Zheng "Partial coherence measurement for the illumination system in excimer laser lithography based on CCD image sensor", Proc. SPIE 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 112091V (20 December 2019); https://doi.org/10.1117/12.2547679
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KEYWORDS
Photomasks

Coherence (optics)

Charge-coupled devices

Error analysis

Lithographic illumination

Lithography

Semiconducting wafers

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