Implications of 64-MB reticle specifications on metrology tool requirements

Bert F. Plambeck; Scott Landstrom; Barry Rockwell

doi:10.1117/12.142154

26 March 1993 Implications of 64-MB reticle specifications on metrology tool requirements

Bert F. Plambeck, Scott Landstrom, Barry Rockwell

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142154
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

The forecasted specifications for 64 meg 5X reticles dramatically reduce the allowable range for CD accuracy and imprecision. These 1992/93 5X reticle CD requirements will demand not only that the photomask supplier manufacture reticles to uniformity requirements unheard of only last year, but also measure them with enough precision to avoid yield loss caused by measurement imprecision. Of fundamental importance is how yield loss is caused and affected by measurement sample size, process capability, measurement specifications, and the magnitude of measurement tool imprecision. This paper describes a cost model developed for metrology tools. The model uses standard formulations of Cp, precision to tolerance ratios (P/T), and measurement tool imprecision to forecast yield loss based on measurement sample size and reticle specifications. The model gives a close look at Cp distortion caused by measurement tool imprecision and what Cp distortion's impact on manufacturing cost is. A `typical' manufacturing environment is modeled and a cost analysis done.

Citation Download Citation

Bert F. Plambeck, Scott Landstrom, and Barry Rockwell "Implications of 64-MB reticle specifications on metrology tool requirements", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142154

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