Planarization of spin-coated films

Loni M. Peurrung; David B. Graves

doi:10.1117/12.130353

1 June 1992 Planarization of spin-coated films

Loni M. Peurrung, David B. Graves

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130353
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

To measure film thickness profiles over substrates with surface topography in situ during spin coating, we use a pulsed laser, a microscope, and a 35-mm camera to stroboscopically create and image interference fringes. The measured film thickness profiles are compared to predictions from a model of the coating flow which accounts for centrifugal, capillary, and viscous forces. This model has been extended to include both radial and azimuthal variations so that the surface contours around fully three-dimensional features may be calculated. Profile asymmetry in the radial direction, known as "pile-up", is caused by surface tension forces near the edges of the feature that accelerate flow where the channel (the film thickness) narrows and retard flow where the film thickness widens.

Citation Download Citation

Loni M. Peurrung and David B. Graves "Planarization of spin-coated films", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130353

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