Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)

Dmitrii R. Ilkayev; Tariel M. Makhviladze; Kamil A. Valiev

doi:10.1117/12.130373

1 June 1992 Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)

Dmitrii R. Ilkayev, Tariel M. Makhviladze, Kamil A. Valiev

Author Affiliations +

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130373
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The research of ways to increase the degree of integration and the functional possibilities of integrated circuits in recent years has resulted in the development of new investigations directed to the creation of new technological processes with high resolution. In the developing of submicron and nanometer technologies, physical and technical difficulties appear that are more critical in comparison with the problems of "old" classical microtechnology

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Dmitrii R. Ilkayev, Tariel M. Makhviladze, and Kamil A. Valiev "Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130373

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