Airborne chemical contamination of a chemically amplified resist

Scott A. MacDonald; Nicholas J. Clecak; H. Russell Wendt; C. Grant Willson; Clinton D. Snyder; C. J. Knors; N. B. Deyoe; John G. Maltabes; James R. Morrow; Anne E. McGuire; Steven J. Holmes

doi:10.1117/12.46354

1 June 1991 Airborne chemical contamination of a chemically amplified resist

Scott A. MacDonald, Nicholas J. Clecak, H. Russell Wendt, C. Grant Willson, Clinton D. Snyder, C. J. Knors, N. B. Deyoe, John G. Maltabes, James R. Morrow, Anne E. McGuire, Steven J. Holmes

Author Affiliations +

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46354
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

We have found that the performance of the t-BOC/onium salt resist system is severely degraded by vapor from organic bases. This effect is very pronounced and can be observed when the coated wafers stand for 15 minutes in air containing as little as 15 parts per billion (ppb) of an organic base. The observed effect, caused by this chemical contamination, depends on the tone of the resist system. For negative tone systems the UV exposure dose, required to obtain the correct linewidth, increases. While for the positive tone system, one observes the generation of a skin at the resist-air interface. Both effects are caused by the photogenerated acid being neutralized by the airborne organic base. There are a wide variety of commonly used materials which can liberate trace amounts of volatile amines and degrade resist performance. For example, fresh paint on a laboratory wall can exhibit this detrimental effect. These effects can be minimized by storing and processing the resist coated wafers in air that has passed through a specially designed, high efficiency carbon filter. The implementation of localized air filtration, to bathe the resist in chemically pure air, enabled this resist system to operate in a manufacturing environment at a rate of 100 wafers/hour.

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Scott A. MacDonald, Nicholas J. Clecak, H. Russell Wendt, C. Grant Willson, Clinton D. Snyder, C. J. Knors, N. B. Deyoe, John G. Maltabes, James R. Morrow, Anne E. McGuire, and Steven J. Holmes "Airborne chemical contamination of a chemically amplified resist", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46354

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