Mask correction for DMD-based lithography testbed with calibrated imaging model

Chaojun Huang; Xu Ma; Shengen Zhang; Jingwen Lei

doi:10.1117/12.3031601

18 July 2024 Mask correction for DMD-based lithography testbed with calibrated imaging model

Chaojun Huang, Xu Ma, Shengen Zhang, Jingwen Lei

Proceedings Volume 13179, International Conference on Optics and Machine Vision (ICOMV 2024); 131791F (2024) https://doi.org/10.1117/12.3031601
Event: International Conference on Optics and Machine Vision (ICOMV 2024), 2024, Nanchang, China

Abstract

Digital micromirror device (DMD) based lithography system, which generates the mask pattern via a spatial light modulator, is increasingly applied in micro-nano fabrication due to its high flexibility and low cost. However, the exposure image is subject to distortion because of the optical proximity effect and the non-ideal system conditions. Correcting mask pattern with calibrated imaging model is an essential approach to improve the image fidelity of DMD-based lithography system. This paper introduces an imaging model calibration method for the DMD-based lithography testbed established by our group. The error convolution kernel and the point spread function in the imaging model are optimized using the batch gradient descent algorithm to fit a set of training data, which represent the impacts of non-ideal imaging process of the DMD-based lithography testbed. Based on the calibrated imaging model, the steepest descent algorithm is used to correct the mask pattern, thus improving the image fidelity of the testbed. Experiments demonstrate the effectiveness of the proposed model calibration method. It also shows that the size of error convolution kernel significantly influences the accuracy of the calibrated imaging model within a certain range. Finally, the effectiveness of the mask correction method is proved by experimental results.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Chaojun Huang, Xu Ma, Shengen Zhang, and Jingwen Lei "Mask correction for DMD-based lithography testbed with calibrated imaging model", Proc. SPIE 13179, International Conference on Optics and Machine Vision (ICOMV 2024), 131791F (18 July 2024); https://doi.org/10.1117/12.3031601

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available