Practical photomask linewidth measurements

James E. Potzick

doi:10.1117/12.20039

1 June 1990 Practical photomask linewidth measurements

James E. Potzick

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20039
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The measurement cycle for practical accurate photomask linewidth measurements is analyzed as a differential measurement- -the linewidth to be measured is compared to a known linewidth on a standard photomask. The linewidth measuring instrument is thus a comparator. The conditions necessary for a valid measurement are discussed with regard to both the instrument and the comparison process. The principles discussed here apply to many other types of measurement as well.

Citation Download Citation

James E. Potzick "Practical photomask linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20039

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available