Low-voltage scanning electron metrology

Harry L. Coleman

doi:10.1117/12.20067

1 June 1990 Low-voltage scanning electron metrology

Harry L. Coleman

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20067
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

This paper deals with the problems of using a low voltage scanning electron beam in a measurement instrument. Consideration shall be given to surface charging and thin film materials, condenser and objective lenses, filaments, scanning coil design, scan generation systems, detectors, and outputs.The measurement of geometries, methods of determining geometry edges, resolution, magnification, focus, depth of focus, image rotation, and staging necessary to locate the geometry to be measured will also be discussed. Data are presented from fundamental research.

Citation Download Citation

Harry L. Coleman "Low-voltage scanning electron metrology", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20067

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