Paper
19 July 1989 Proximity- and Astigmatism-Tolerant Testsites For Electrical Linewidth Measurement
B. J. Lin
Author Affiliations +
Abstract
Electrical linewidth measurement is well-known for high precision and throughput. However, the standard four-point probe testsite is only useful for measuring the width of an isolated conducting line. Line-and-space and isolated spaces can be simulated satisfactorily by adding dummy lines parallel to the active line but weak links or potential electrical shorting situations often prematurely cause these structures to fail before their true limits are reached. In this paper, fully wrapped proximity- and astigmatism-tolerant designs for line-and-space and isolated spaces are shown. They have been successfully demonstrated with printed images. An application in evaluating the exposure-defocus window of a one-layer i-line resist using the proximity-tolerant testsites is given.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. J. Lin "Proximity- and Astigmatism-Tolerant Testsites For Electrical Linewidth Measurement", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953081
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KEYWORDS
Semiconducting wafers

Monochromatic aberrations

Lead

Lithography

Inspection

Integrated circuits

Metrology

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