Paper
1 June 1990 Electrical measurements of overlay using the Prometrix Lithomap LM20
David Martin
Author Affiliations +
Abstract
New test structures for the electrical measurement of overlay using the Prometrix Lithomap LM2O have been designed. These have been extensively used to assess the performance of Canon FPA 1550 step-and--repeat alignment instruments. Results indicate that 98 % of the measured sites are within alignment tolerance of +1- 0.4 microns.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David Martin "Electrical measurements of overlay using the Prometrix Lithomap LM20", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20081
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KEYWORDS
Optical alignment

Semiconducting wafers

Overlay metrology

Staring arrays

Process control

Integrated circuits

Inspection

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