Reticle metrology requirements: systems and methods

Scott Landstrom; Bert F. Plambeck

doi:10.1117/12.177431

1 January 1994 Reticle metrology requirements: systems and methods

Scott Landstrom, Bert F. Plambeck

Proceedings Volume 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review; 102730B (1994) https://doi.org/10.1117/12.177431
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

As leading edge semiconductor devices design rules continue their downward migration, the required reticle manufacturing tolerances continue tightening. In particular, as CD and registration specifications shrink, the metrology system's precision and accuracy used to measure reticle parameters becomes increasingly important. Additionally, as advanced reticle design tolerances tighten, the sample size needed to obtain the same level of confidence to be certain a given reticle meets specification also rises. Consequently, with shrinking tolerances and escalating sample sizes required to manufacture leading edge reticles, metrology is a key area requiring dramatic improvement in the 90's. A brief review of specification trends, metrology statistics, and the mask making equipment needed to meet such requirements is presented.

Citation Download Citation

Scott Landstrom and Bert F. Plambeck "Reticle metrology requirements: systems and methods", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730B (1 January 1994); https://doi.org/10.1117/12.177431

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