On-product metrology results from MEBES 4-TFE System

Christopher P. Braun; Frederick R. Peiffer

doi:10.1117/12.262832

27 December 1996 On-product metrology results from MEBES 4-TFE System

Christopher P. Braun, Frederick R. Peiffer

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262832
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

At Lucent Technologies, lithography tool performance metric measurements are required on every plate. The QA cell patterning is designed to monitor the lithography tool, and the data is captured within the Mask Information Management System. It allows the manufacturer to use actual production data to determine machine performance trends, and it yields an extremely large sample of plates for SPC purposes. Closure, X vs. Y uniformity, butting, and registration data is reported in this way. The usage of on-product data for machine metrology is demonstrated, and actual production performance of the MEBES 4 TFE is shown.

Citation Download Citation

Christopher P. Braun and Frederick R. Peiffer "On-product metrology results from MEBES 4-TFE System", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262832

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