Particle Detection By Low Voltage SEM

Paul Buysse; Fedor Coopmans

doi:10.1117/12.968353

1 January 1988 Particle Detection By Low Voltage SEM

Paul Buysse, Fedor Coopmans

Proceedings Volume 0921, Integrated Circuit Metrology, Inspection, and Process Control II; (1988) https://doi.org/10.1117/12.968353
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

In an effort to learn more about the nature and distribution in size of particles encountered in device fabrication, we have studied the non destructive inspection performance obtained with standard and low voltage scanning electron microscopes. To simulate particle defects in and on layers, diamond particles with known size were used. This present study proves that the low voltage SEM is an excellent tool to detect and measure very small particle defects on layers but the performance for particles within layers is marginal.

Citation Download Citation

Paul Buysse and Fedor Coopmans "Particle Detection By Low Voltage SEM", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968353

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available