Dr. Hironobu Sato
at EIDEC
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 19 March 2018 Presentation
Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Ken Miyagi, Masayuki Shiraishi, Ryota Matsuki, Terumasa Kosaka, Toshiyuki Himi, Seiji Nagahara, Alvin Chandra, Ryuichi Nakatani, Teruaki Hayakawa, Kenji Yoshimoto, Takuya Omosu, Mikihito Takenaka
Proceedings Volume 10586, 105860S (2018) https://doi.org/10.1117/12.2297310
KEYWORDS: Directed self assembly, Image processing, Signal processing, Electron beam lithography, Lithography, Annealing, Thin films, Epitaxy, Data modeling, 3D modeling

Proceedings Article | 13 March 2018 Presentation + Paper
Proceedings Volume 10586, 105860U (2018) https://doi.org/10.1117/12.2297287
KEYWORDS: Bridges, Polymethylmethacrylate, Picosecond phenomena, Etching, Molecular bridges, Reactive ion etching, Directed self assembly, Photomasks, Image processing, Chemical analysis

Proceedings Article | 25 May 2017 Presentation
Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Phubes Jiravanichsakul, Teruaki Hayakawa, Kenji Yoshimoto, Mikihito Takenaka
Proceedings Volume 10146, 101460O (2017) https://doi.org/10.1117/12.2257936
KEYWORDS: Annealing, 3D modeling, Lithography, Optical lithography, Scattering, Atomic force microscopy, Data modeling, Semiconductor manufacturing, Directed self assembly, Materials processing

Proceedings Article | 4 April 2016 Paper
Proceedings Volume 9778, 977816 (2016) https://doi.org/10.1117/12.2218605
KEYWORDS: Directed self assembly, Epitaxy, Chemical analysis, Line width roughness, Annealing, Etching, Line edge roughness, Polymethylmethacrylate, Lithography, Edge roughness

Proceedings Article | 1 April 2016 Paper
Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Shinya Minegishi, Ken Miyagi, Hitoshi Kubota, Hideki Kanai, Katsuyoshi Kodera, Masayuki Shiraishi, Naoko Kihara, Yoshiaki Kawamonzen, Toshikatsu Tobana, Katsutoshi Kobayashi, Hitoshi Yamano, Tsukasa Azuma, Satoshi Nomura
Proceedings Volume 9777, 97771T (2016) https://doi.org/10.1117/12.2218787
KEYWORDS: Optical lithography, Metals, Photoresist processing, Semiconductor manufacturing, Semiconductors, Manufacturing, Epitaxy, Semiconducting wafers, Scanning electron microscopy, Silica, Directed self assembly, Etching, Photomasks, Electron beam lithography, Chemical mechanical planarization, Reactive ion etching, Metrology, Tin

Showing 5 of 15 publications
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