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Dr. Zdenek Chalupa
at CEA-LETI
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Publications (1)
Proceedings Article | 19 March 2018 Paper
Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
P. Pimenta-Barros, G. Claveau, M. Argoud, Z. Chalupa, N. Allouti, C. Comboroure, G. Chamiot-Maitral, N. Posseme, L. Pain, R. Tiron, C. Navarro, C. Nicolet, I. Cayrefourcq
Proceedings Volume 10584, 105840C (2018) https://doi.org/10.1117/12.2297407
KEYWORDS: Etching, Silicon, Ultraviolet radiation, Directed self assembly, Polymethylmethacrylate, Scanning electron microscopy, Plasma, Nanowires, Line width roughness, Surface properties
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